RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023153089

Kind Code:

A

Abstract:

To provide a resist composition that produces a resist pattern with excellent CD uniformity.SOLUTION: A resist composition contains an acid generator containing a salt represented by formula (I), and an acid-stable resin containing one or more structural units represented by the formula (a2).SELECTED DRAWING: None

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Inventors:

SAITO MARINA
KOMURO KATSUHIRO
ICHIKAWA KOJI

Application Number:

JP2023058532A

Publication Date:

October 17, 2023

Filing Date:

March 31, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07C309/06; G03F7/004; C07C309/17; C07C309/58; C07C381/12; C07D307/00; C07D321/06; C08F12/22; C08F20/12; C09K3/00; G03F7/039

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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