RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023169194

Kind Code:

A

Abstract:

To provide a resist composition and the like which allow a resist pattern having good LER to be produced.SOLUTION: The resist composition contains: an acid generator containing a salt represented by formula (I); and a resin containing a structural unit having an acid-labile group and a structural unit represented by formula (a2-A). [In the formula (I), R1-R5 each represent a halogen atom or a perfluoroalkyl group; R6-R8 each represent a halogen atom, a hydroxy group or the like; m5 represents an integer of 1-5; m6 and m7 represent integers of 0-3; m8 represents an integer of 0-4; and Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group.]SELECTED DRAWING: None

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Inventors:

ADACHI YUKAKO
ICHIKAWA KOJI

Application Number:

JP2023139577A

Publication Date:

November 29, 2023

Filing Date:

August 30, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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