Title:
レジスト組成物、レジストパターンの製造方法及び化合物
Document Type and Number:
Japanese Patent JP6801703
Kind Code:
B2
Abstract:
A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.
Inventors:
Tatsuro Masuyama
Shingo Fujita
Koji Ichikawa
Shingo Fujita
Koji Ichikawa
Application Number:
JP2018229700A
Publication Date:
December 16, 2020
Filing Date:
December 07, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C71/00; C07D321/10
Other References:
Journal of the Chemical Society Perkin Transactions 1,1995年,17,pp.2135-2139
Journal of the Chemical Society Perkin Transactions 1,1993年,20,pp.2417-2427
Tetrahedron,1993年,49(36),pp.8241-8256
ZHURNAL ORG KHIMII,1981年,17(10),pp.2236-2237
Journal of the Chemical Society Perkin Transactions 1,1993年,20,pp.2417-2427
Tetrahedron,1993年,49(36),pp.8241-8256
ZHURNAL ORG KHIMII,1981年,17(10),pp.2236-2237
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto