Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND
Document Type and Number:
Japanese Patent JP2013125146
Kind Code:
A
Abstract:

To provide a resist composition excellent in lithography characteristics and storage stability, a resist pattern formation method using the resist composition, and a new compound useful as a photoreactive quencher for use in the resist composition.

There is provided a resist composition containing: a base component (A) having solubility characteristics to a developing solution that is changed by the action of an acid; a photoreactive quencher (C); and an acid generator composition (B) that generates an acid by being exposed to light, the photoreactive quencher (C) containing a compound expressed by the following general formula (c1) where R1 denotes a hydrogen atom or a 1-20C hydrocarbon radical which may have a substituent group, R2 and R3 each independently denote a hydrogen atom or a 1-20C hydrocarbon radical which may have a substituent group, and at least two or three of R1 to R3 may form a ring by bonding with each other. X denotes an oxygen atom or a sulfur atom. n is 0 or 1. Z+ denotes organic cation. [FORMULA 1]


Inventors:
KOMURO YOSHITAKA
UTSUMI YOSHIYUKI
KAWAKAMI AKINARI
NAMITO TOSHIAKI
Application Number:
JP2011273768A
Publication Date:
June 24, 2013
Filing Date:
December 14, 2011
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; C07C25/02; C07C59/125; C07C59/70; C07C69/14; C07C69/753; C07C381/12; C07D333/46; C07D333/54; C07D333/76; C07D335/02; C07D335/16; C07D493/08; C07D497/08; G03F7/039
Domestic Patent References:
JPH09179303A1997-07-11
JPH09127700A1997-05-16
JP2008239918A2008-10-09
JP2006106354A2006-04-20
JP2006001144A2006-01-05
JP2005014603A2005-01-20
JP2004354954A2004-12-16
JP2004029111A2004-01-29
JP2004012898A2004-01-15
JP2003316005A2003-11-06
JP2002148790A2002-05-22
JP2001343742A2001-12-14
JP2002122994A2002-04-26
JP2003207886A2003-07-25
JP2004029136A2004-01-29
JP2001281849A2001-10-10
JP2004310004A2004-11-04
JP2013092590A2013-05-16
JPH09179303A1997-07-11
JPH09127700A1997-05-16
JP2008239918A2008-10-09
JP2006106354A2006-04-20
JP2006001144A2006-01-05
JP2005014603A2005-01-20
JP2004354954A2004-12-16
JP2004029111A2004-01-29
JP2004012898A2004-01-15
JP2003316005A2003-11-06
JP2002148790A2002-05-22
JP2001343742A2001-12-14
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi



 
Previous Patent: RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

Next Patent: INFORMATION PROCESSING DEVICE AND PROGRAM