Title:
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT
Document Type and Number:
Japanese Patent JP2023168942
Kind Code:
A
Abstract:
To provide a resist composition capable of forming a resist pattern with good CDU, a resist pattern formation method using the resist composition, and a compound useful as an acid diffusion control agent used for the resist composition.SOLUTION: There is provided a resist composition which generates an acid upon exposure to light and of which solubility in a developing solution is changed by an action of an acid. The resist composition contains a resin component (A1) of which the solubility in a developing solution is changed by the action of an acid, and a compound (D0) represented by a general formula (d0) (where Ar is an aromatic ring; I is an iodine atom; Rd1 is a substituent; nd2 is an integer equal to or greater than 1 as far as a valence permits; and Z+ is an organic cation).SELECTED DRAWING: None
Inventors:
NAGAMINE TAKASHI
KOJIMA TAKAHIRO
SUZUKI KENTA
KOJIMA TAKAHIRO
SUZUKI KENTA
Application Number:
JP2022080340A
Publication Date:
November 29, 2023
Filing Date:
May 16, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
C07C63/72; G03F7/004; C07C381/12; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
田▲崎▼ 聡
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Previous Patent: Ultrasonic time series data processing device and ultrasound time series data processing program
Next Patent: toner cartridge
Next Patent: toner cartridge