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Patent Searching and Data


Title:
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2019207299
Kind Code:
A
Abstract:
To provide a resist composition having good lithographic characteristics, and a resist pattern forming method using the resist composition.SOLUTION: The resist composition contains a compound represented by general formula (bd1) and comprising an anionic moiety and a cationic moiety. In the formula (bd1), Rx-Rxeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; Ry-Ryeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; Rz-Rzeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; at least one of Rx-Rx, Ry-Ryand Rz-Rzhas an anionic group; and Mrepresents a sulfonium cation having a sulfonyl group.SELECTED DRAWING: None

Inventors:
SHIOSAKI MASAHIRO
ARAI MASATOSHI
Application Number:
JP2018101877A
Publication Date:
December 05, 2019
Filing Date:
May 28, 2018
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; C07C61/39; C07C309/12; C07C309/24; G03F7/039; G03F7/20
Domestic Patent References:
JP2012003249A2012-01-05
JP2013092618A2013-05-16
Attorney, Agent or Firm:
Sumio Tanai
Matsumoto
Ryu Miyamoto
Masato Iida