Title:
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2019207407
Kind Code:
A
Abstract:
To provide a resist composition which achieves higher sensitivity and is capable of forming a resist pattern having a good shape with further reduced roughness, and a resist pattern forming method.SOLUTION: The resist composition contains: a resin component having a constituent unit including a carbon-carbon unsaturated bond site in a group which dissociates by the action of an acid; and a compound represented by general formula (bd1). In the formula (bd1), Rx-Rxeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; Ry-Ryeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; Rz-Rzeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; at least one of Rx-Rx, Ry-Ryand Rz-Rzhas an anionic group, and an anionic moiety as a whole is an n-valent anion; and Mrepresents an m-valent organic cation.SELECTED DRAWING: None
Inventors:
MICHIBAYASHI NOBUHIRO
ARAI MASATOSHI
ARAI MASATOSHI
Application Number:
JP2019098912A
Publication Date:
December 05, 2019
Filing Date:
May 27, 2019
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/039; C07C61/39; C07C309/12; C07C309/17; C07C309/24; C07C381/12; C07D307/00; C08F220/28; C09K3/00; G03F7/004; G03F7/20
Domestic Patent References:
| JP2013015572A | 2013-01-24 | |||
| JP2013092618A | 2013-05-16 | |||
| JP2018028574A | 2018-02-22 | |||
| JP2018194623A | 2018-12-06 |
Foreign References:
| WO2017179727A1 | 2017-10-19 | |||
| CN107793335A | 2018-03-13 | |||
| KR20150083779A | 2015-07-20 | |||
| CN107793335A | 2018-03-13 |
Attorney, Agent or Firm:
Sumio Tanai
Matsumoto
Ryu Miyamoto
Masato Iida
Matsumoto
Ryu Miyamoto
Masato Iida