Title:
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2023183798
Kind Code:
A
Abstract:
To provide a resist composition that can achieve high sensitivity and reduce roughness and scum, and a resist pattern forming method in which the resist composition is used.SOLUTION: Provided is a resist composition that contains a metal compound and the structure of the metal compound changes upon exposure as well as the solubility of the metal compound in a developer changes, and in which the metal compound contains a cubane type metal oxide.SELECTED DRAWING: None
Inventors:
INARI TAKATOSHI
ARAI MASATOSHI
KOMURO YOSHITAKA
ARAI MASATOSHI
KOMURO YOSHITAKA
Application Number:
JP2022097528A
Publication Date:
December 28, 2023
Filing Date:
June 16, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; C07D207/34; C07D213/18; C07D213/30; C07D213/80; C07F3/06; C07F7/00; C07F7/22; C07F13/00; C07F15/04; C07F15/06; G03F7/20
Attorney, Agent or Firm:
田▲崎▼ 聡
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Previous Patent: Oral composition
Next Patent: Non-contact temperature measuring device and image forming device equipped with the same
Next Patent: Non-contact temperature measuring device and image forming device equipped with the same