RESIST COMPOSITION AND PATTERN FORMING METHOD

Japanese Patent JP3690847

B2

PROBLEM TO BE SOLVED: To enhance sensitivity and resolution by using, as a dissolution inhibitor, a specified compound having a lone electron pair-holding part for gathering the alkali-soluble parts of a base resin to the side of a dissolution inhibiting function part using this lone electron pair-holding part selected from the group consisting of a group containg oxygen atom and the like.
SOLUTION: The dissolution inhibitor is represented by formula I in which A is a structure comprising a group of atoms for completing the main cyclic or noncyclic nucleus of a dissolution inhibiting structure; SIG is, independently, a dissolution inhibiting group combined with and releasable from the structure A by the action of acid; and (m) is an integer of ≥1 of SIG combined with A. The structure A of the dissolution inhibitor has a part of holding lone electron pair for gathering the alkali soluble parts of the base resin to the side of the dissolution inhibiting parts and this part for holding the lone electron pair is a group having oxygen groups combined with a double bond represented by formula II or a group selected from an alkoxy group, such as -OCH3, and the like.

Namiki Takahisa
Ei Yano
Keiji Watanabe
Field saki Koji
Miwa Igarashi
Kuramitsu Yoko

JP24203395A

August 31, 2005

September 20, 1995

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富士通株式会社

G03F7/004; G03F7/032; G03F7/039; (IPC1-7): G03F7/004; G03F7/039

JP7092677A
JP6266109A
JP6043653A
JP6043652A
JP6266110A
JP6287163A
JP7120929A
JP6167811A
JP7128852A
JP5313371A
JP6043630A
JP5142774A
JP7138249A

Takashi Ishida
Toshio Toda
Masaya Nishiyama

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