RESIST COMPOSITION AND RESIST PATTERN PRODUCING METHOD

Title:

RESIST COMPOSITION AND RESIST PATTERN PRODUCING METHOD

Document Type and Number:

Japanese Patent JP2012252244

Kind Code:

A

Abstract:

To provide a resist composition capable of producing a resist pattern with excellent line edge roughness (LER).

The resist composition includes: a resin having a structural unit represented by the formula (a); a resin having a structural unit represented by the formula (a4-8); (B) an acid generator; and (D) a solvent, where R³ represents a sulpholane ring group represented by the formula (b); A^a41 represents an alkanediyl group which may have a substituent, or the like; and R^a42 represents an aliphatic hydrocarbon group.

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Inventors:

KAWAMURA MAKI
KIN KYOCHU
KAMABUCHI AKIRA
ICHIKAWA KOJI

Application Number:

JP2011125996A

Publication Date:

December 20, 2012

Filing Date:

June 06, 2011

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/039; C08F20/10; G03F7/004; H01L21/027

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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