Title:
RESIST COMPOSITION AND RESIST PATTERN PRODUCING METHOD
Document Type and Number:
Japanese Patent JP2012252244
Kind Code:
A
Abstract:
To provide a resist composition capable of producing a resist pattern with excellent line edge roughness (LER).
The resist composition includes: a resin having a structural unit represented by the formula (a); a resin having a structural unit represented by the formula (a4-8); (B) an acid generator; and (D) a solvent, where R3 represents a sulpholane ring group represented by the formula (b); Aa41 represents an alkanediyl group which may have a substituent, or the like; and Ra42 represents an aliphatic hydrocarbon group.
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Inventors:
KAWAMURA MAKI
KIN KYOCHU
KAMABUCHI AKIRA
ICHIKAWA KOJI
KIN KYOCHU
KAMABUCHI AKIRA
ICHIKAWA KOJI
Application Number:
JP2011125996A
Publication Date:
December 20, 2012
Filing Date:
June 06, 2011
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/039; C08F20/10; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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