To provide a resist composition from which a resist pattern with superior pattern collapse resistance can be produced.

The resist composition contains an acid generator expressed by formula (I) and a resin having an acid-labile group. In formula (I), R¹ and R² each independently represent a hydrocarbon group having 1 to 12 carbon atoms, alkoxy group having 1 to 6 carbon atoms, acyl group having 2 to 7 carbon atoms, acyloxy group having 2 to 7 carbon atoms, alkoxycarbonyl group having 2 to 7 carbon atoms, nitro group or a halogen atom; m and n each independently represent an integer of 0 to 4, and when m is 2 or more, a plurality of R¹ may be the same or different from each other, and when n is 2 or more, a plurality of R² may be the same or different from each other; A- represents an organic anion.