Title:
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR
Document Type and Number:
Japanese Patent JP2023135555
Kind Code:
A
Abstract:
To provide a resist composition capable of forming a resist pattern good in CDU and resolution.SOLUTION: The resist composition contains a base component (A) and a compound (B0) represented by general formula (b0). In the formula, Rpg represents an acid-decomposable group; Rl0 represents an optionally substituted cyclic organic group; L02 represents a divalent linking group; L01 represents a divalent linking group or a single bond; Rm1 represents a substituent other than an iodine atom; Vb0 represents a single bond or the like; R0 represents a hydrogen atom or the like; nb1 represents an integer of 1-4; nb2 represents an integer of 1-4; nb3 represents an integer of 0-3; Mm+ represents an m-valent organic cation; and m represents an integer of 1 or more.SELECTED DRAWING: None
Inventors:
NGUYEN KHANHTIN
Application Number:
JP2022040827A
Publication Date:
September 28, 2023
Filing Date:
March 15, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; C07C309/12; C07C381/12; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
田▲崎▼ 聡
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi