Title:
レジスト組成物及びレジストパターン形成方法、並びに、化合物及び酸拡散制御剤
Document Type and Number:
Japanese Patent JP6663677
Kind Code:
B2
Abstract:
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z- represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m. Z- (Mm+ )1/m ...(d1).
Inventors:
Takashi Nagamine
Kotaro Endo
Hitoshi Nito
Kotaro Endo
Hitoshi Nito
Application Number:
JP2015198778A
Publication Date:
March 13, 2020
Filing Date:
October 06, 2015
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C07C65/05; C07C381/12; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2015045736A | ||||
| JP2012137565A | ||||
| JP2012220572A | ||||
| JP2014219664A | ||||
| JP2006091766A | ||||
| JP2000194090A |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida