Title:
レジスト組成物およびレジストパターン形成方法
Document Type and Number:
Japanese Patent JP6942052
Kind Code:
B2
Abstract:
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to R3 each independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Y1 represents a single bond or a divalent linking group containing an oxygen atom; M1+ to M3+ represents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within R2 has no fluorine atom bonded thereto).R1—Y1—(CF2)n—SO3−M1+ (b1)R2—(CH2)m—SO3−M2+ (b2)R3—COO−M3+ (b3)
Inventors:
Takeshi Nakamura
Isano Tanno
Lee Jun Yeop
Isano Tanno
Lee Jun Yeop
Application Number:
JP2017545451A
Publication Date:
September 29, 2021
Filing Date:
October 13, 2016
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20; G03F7/32
Domestic Patent References:
| JP2015004967A | ||||
| JP2014209167A | ||||
| JP2014102334A | ||||
| JP2015090457A | ||||
| JP2007114765A | ||||
| JP2006251551A | ||||
| JP2005274647A | ||||
| JP2008100988A | ||||
| JP2008076559A |
Foreign References:
| WO2012133352A1 | ||||
| WO2015025859A1 | ||||
| WO2012070548A1 | ||||
| WO2011030737A1 |
Attorney, Agent or Firm:
Sumio Tanai
Matsumoto
Ryu Miyamoto
Masato Iida
Matsumoto
Ryu Miyamoto
Masato Iida