Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7300823
Kind Code:
B2
Abstract:
A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W1 portion converted into a main chain (in formula (d0), Rd01 represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W1 represents a polymerizable group-containing group; Ct represents a tertiary carbon atom, and the α-position of Ct is a carbon atom which constitutes a carbon-carbon unsaturated bond; R11 represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R12 and R13 each independently represents a chain hydrocarbon group, or R12 and R13 are mutually bonded to form a cyclic group).
Inventors:
Yasuhiro Yoshii
Masato Yahagi
Youichi Hori
Takahiro Kojima
Masato Yahagi
Youichi Hori
Takahiro Kojima
Application Number:
JP2018226479A
Publication Date:
June 30, 2023
Filing Date:
December 03, 2018
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/039; C08F20/40; G03F7/004; G03F7/20
Domestic Patent References:
| JP2016085382A | ||||
| JP2020008640A |
Foreign References:
| WO2012117949A1 | ||||
| WO2012070548A1 |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
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