Title:
レジスト組成物、及び、レジストパターン形成方法
Document Type and Number:
Japanese Patent JP7376632
Kind Code:
B2
Abstract:
This resist composition contains a resin component (A1) having a constituent unit (a01) and a constituent unit (a02). In the formulas, W01 and W02 are groups containing polymerizable groups. Ya01 and Ya02 are single bonds or divalent linking groups. Rax01 is an acid-dissociable group represented by formula (a0-r-1) or (a0-r-2). Q01 and q02 are integers from 0 to 3. N01 and n02 are integers of 1 or higher. In formula (a0-r-1), Ra01 to Ra03 are hydrocarbon groups. In formula (a0-r-2), Ra04 is a hydrocarbon group. Ra05a and Ra05b are hydrogen atoms, etc. Ra06 is a hydrogen atom, etc.
Inventors:
Issei Suzuki
Yuki Onishi
Yuki Onishi
Application Number:
JP2022036949A
Publication Date:
November 08, 2023
Filing Date:
March 10, 2022
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/039; C08F212/14; C08F220/18; G03F7/004; G03F7/20
Domestic Patent References:
| JP20227909A | ||||
| JP2019219469A | ||||
| JP2021110922A |
Foreign References:
| US4245030 |
Attorney, Agent or Firm:
田▲崎▼ 聡
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi