To provide a resist composition allowing good line width roughness (LWR) of an obtained pattern.
A resist composition contains a polymer (II) having a structural unit from a monomer represented by the formula (I) and a structural unit from a monomer (a1) having a group unstable to acid; and an acid generator. [In the formula (I), R1 represents a hydrogen atom or a methyl group. R2 represents an aromatic hydrocarbon group having a carbon number of 6 to 12 which may have a substituent. R3 represents a hydrocarbon group or a cyano group having a carbon number of 1 to 12 which may have a substituent, where the hydrocarbon group may include a hetero atom. A1 represents a single bond or -(CH2)m1-CO-O-*, -(CH2)m2-OCO-(CH2)m3-CO-O-*. m1, m2 and m3 each represents an integer of 1 to 6. * represents a bonding hand with N.]
HASHIMOTO KAZUHIKO
SHIGEMATSU JUNJI
Toru Sakamoto