To provide a resist composition that can obtain a pattern having an excellent focus margin.
A resist composition comprises: an iodonium salt having an anion represented by formula (IA); an acrylic resin which has an acid-labile group, and is insoluble or sparingly soluble in an aqueous alkali solution and can dissolve in an aqueous alkali solution by an action of an acid; and an acid generator. In formula (IA), R1 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms or an aralkyl group having 7 to 21 carbon atoms; R2 represents an aliphatic hydrocarbon group having 7 to 12 carbon atoms, an alicyclic hydrocarbon group having 7 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms or aralkyl group having 7 to 21 carbon atoms; and R1 and R2 may be bonded to form a C4-C20 nitrogen-containing ring with N.
YAMAGUCHI NORIFUMI
坂元 徹