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Patent Searching and Data


Title:
RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2012185482
Kind Code:
A
Abstract:

To provide a resist composition that can obtain a pattern having an excellent focus margin.

A resist composition comprises: an iodonium salt having an anion represented by formula (IA); an acrylic resin which has an acid-labile group, and is insoluble or sparingly soluble in an aqueous alkali solution and can dissolve in an aqueous alkali solution by an action of an acid; and an acid generator. In formula (IA), R1 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms or an aralkyl group having 7 to 21 carbon atoms; R2 represents an aliphatic hydrocarbon group having 7 to 12 carbon atoms, an alicyclic hydrocarbon group having 7 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms or aralkyl group having 7 to 21 carbon atoms; and R1 and R2 may be bonded to form a C4-C20 nitrogen-containing ring with N.


Inventors:
MASUYAMA TATSURO
YAMAGUCHI NORIFUMI
Application Number:
JP2012005890A
Publication Date:
September 27, 2012
Filing Date:
January 16, 2012
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C08F220/12; G03F7/039; H01L21/027; C07C25/02; C07C307/02
Attorney, Agent or Firm:
中山 亨
坂元 徹