Title:
RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3202792
Kind Code:
B2
Abstract:
PURPOSE: To obtain a positive resist compsn. which realizes good pattern forming by repeating exposure and development of the resist layer for several times and gives excellent adhesion property between the resist layer and the substrate.
CONSTITUTION: This resist compsn. contains a polymer (a) having 2-200 acid value and a photoactivator (b) which produces acid by exposure. The polymer (a) consists of 20-94wt.% t-butylester of α,β-ethylene unsatd. carboxylic acid, 5-79wt.% (meth)acrylate expressed by formula CH2=C(R1)-COO-(R2-O)n-R3, and 1-75wt.% of other α,β-ethylene unsatd. compd. In formula, R1 is hydrogen or methyl group, R2 is an alkylene group of 1-6 carbon number, R3 is an alkyl group, aryl group, or aralkyl group of 1-6 carbon number, and n is an integer 1-10.
Inventors:
Takahito Kishida
Akira Matsumura
Atsushi Kawakami
Akira Matsumura
Atsushi Kawakami
Application Number:
JP16084092A
Publication Date:
August 27, 2001
Filing Date:
June 19, 1992
Export Citation:
Assignee:
Nippon Paint Co., Ltd.
International Classes:
G03F7/00; C08F220/10; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; H01L21/027
Domestic Patent References:
| JP3192173A | ||||
| JP2309358A | ||||
| JP5506731A | ||||
| JP5506106A |
Attorney, Agent or Firm:
Aoyama Ryo (2 outside people)