Title:
RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3841406
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition excellent in sensitivity, resolving power and profile.
SOLUTION: The resist composition contains a specified sulfonium compound which contains a group having a -CON- bond or a -SO2N- bond and generates an acid upon irradiation with an actinic ray or a radiation.
Inventors:
Kunihiko Kodama
Application Number:
JP2002112372A
Publication Date:
November 01, 2006
Filing Date:
April 15, 2002
Export Citation:
Assignee:
Fuji Photo Film Co., Ltd.
International Classes:
G03F7/004; C07C381/12; C08F12/14; C08F220/18; C08F220/26; C08F232/04; C09K3/00; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; C07C381/12; C08F12/14; C08F220/18; C08F220/26; C08F232/04; C09K3/00; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP9118663A | ||||
| JP2002265436A | ||||
| JP2001330947A |
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu