Title:
レジスト組成物
Document Type and Number:
Japanese Patent JP6748493
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern can be produced with good CD uniformity (CDU).SOLUTION: The resist composition comprises: a resin (A1) containing a structural unit represented by formula (a4-0) and a structural unit having an acid-labile group; and an acid generator (Ba) having 3 to 18 fluorine atoms and a cyclic structure. In the formula, Rrepresents a hydrogen atom or a methyl group; Lrepresents a single bond or an aliphatic saturated hydrocarbon group having 1 to 4 carbon atoms; Lrepresents a perfluoroalkane diyl group having 1 to 8 carbon atoms or a perfluorocycloalkane diyl group having 3 to 12 carbon atoms; and Rrepresents a hydrogen atom or a fluorine atom.SELECTED DRAWING: None
Inventors:
Satoshi Yamamoto
Masashi Yoshida
Koji Ichikawa
Masashi Yoshida
Koji Ichikawa
Application Number:
JP2016130173A
Publication Date:
September 02, 2020
Filing Date:
June 30, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C07D321/10; C07D321/12; C08F220/24; G03F7/038; G03F7/039
Domestic Patent References:
| JP2014167589A | ||||
| JP2013064785A | ||||
| JP2014112209A | ||||
| JP2015092231A | ||||
| JP2013130884A | ||||
| JP2014010436A | ||||
| JP2015078385A | ||||
| JP2014224984A | ||||
| JP6052283B2 | ||||
| JP6304246B2 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation