PURPOSE: To prevent halation and notching on a high-reflective substrate, to stabilize a pattern against prebaking, to enhance resolution, and to restrain deterioration in sensitivity due to addition of a light absorbing agent by incorpo rating a specified compound as the light absorbing agent.
CONSTITUTION: The compound to be added as the light absorbing agent is represented by formula I in which each of R1 - R3 is independently H, optionally substituted alkyl, halogen, or OH; each of X and Y is independently cyano, -COOR, or CONHR'; R is alkyl; and R' is H or aryl. It is preferred to use the resist composition containing this compound as the positive type resist composition and the composition comprising a novolak resin obtained by polycondensing some of phenols with formaldehyde, and 1, 2-quinonediazideo compound, thus permitting halation and notching on the high-reflective substrate to be prevented, a pattern to be stabilized against prebaking, resolution to be enhanced, and deterioration of sensitivity due to addition of th agent to be restrained.
MATSUOKA MASARU
HANAWA RYOTARO
KAMIYA YASUNORI
TAKEYAMA NAOMOTO
HIOKI TAKESHI
TAKAGAKI HIROSHI
| JPH02269346A | 1990-11-02 |