Title:
RESIST FOR FORMING FINE PATTERN AND FINE PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JPH06342212
Kind Code:
A
Abstract:
PURPOSE: To provide a resist for forming a fine pattern causing little dimensional change to a resist pattern, transmitting ArF excimer laser light and less expensive than the conventional resist.
CONSTITUTION: A two-component material consisting of a high molecular compd. represented by the formula and an acid generating agent is used as the objective resist. In the formula, each of R1-R6 is H, alkoxycarbonyl, alkyl, alkoxyalkyl, alkylsilyl, tetrahydropyranyl, alkoxycarbonylmethyl or hydroxypropyl.
Inventors:
KATSUYAMA AKIKO
HASHIMOTO KAZUHIKO
HASHIMOTO KAZUHIKO
Application Number:
JP6588094A
Publication Date:
December 13, 1994
Filing Date:
April 04, 1994
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
G03F7/004; G03F7/033; G03F7/039; H01L21/027; H01L21/312; (IPC1-7): G03F7/039; G03F7/004; G03F7/033; H01L21/027; H01L21/312
Attorney, Agent or Firm:
Hiroshi Maeda (2 outside)