Title:
RESIST LAMINATE USED FOR IMMERSION LITHOGRAPHY
Document Type and Number:
Japanese Patent JP2010191447
Kind Code:
A
Abstract:
To provide a resist laminate transparent to exposure light at a wavelength of not less than 193 nm, which is capable of forming a fine pattern having a desired shape without defects and with good reproducibility during immersion exposure.
The resist laminate has a photoresist layer (L1) and a transparent protective layer (L2) on a substrate, wherein the protective layer (L2) is formed on an outermost surface of the laminate. The protective layer (L2) has an absorption coefficient of not more than 1.0 μm-1 for ultraviolet light having a wavelength of not less than 193 nm, a dissolution rate in a developing solution of not less than 50 nm/sec and a dissolution rate in pure water of not more than 10 nm/min.
Inventors:
ARAKI TAKAYUKI
YAMASHITA TSUNEO
ISHIKAWA TAKUJI
YAMASHITA TSUNEO
ISHIKAWA TAKUJI
Application Number:
JP2010065025A
Publication Date:
September 02, 2010
Filing Date:
March 19, 2010
Export Citation:
Assignee:
DAIKIN IND LTD
International Classes:
G03F7/039; G03F7/11; G03F7/20; G03F7/38; H01L21/027; G03F7/004
Domestic Patent References:
| JPH11352697A | 1999-12-24 | |||
| JP2005019433A | 2005-01-20 | |||
| JP2005019433A | 2005-01-20 | |||
| JP2005055890A | 2005-03-03 | |||
| JP2005183523A | 2005-07-07 |
Attorney, Agent or Firm:
Kawamura Taku
Yousuke Fujimori
Seiji Tani
Yousuke Fujimori
Seiji Tani