Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5440515
Kind Code:
B2
Abstract:
A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.
Inventors:
Justice
Jun Hatakeyama
Takeshi Watanabe
Tomohiro Kobayashi
Jun Hatakeyama
Takeshi Watanabe
Tomohiro Kobayashi
Application Number:
JP2011005428A
Publication Date:
March 12, 2014
Filing Date:
January 14, 2011
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F20/26; G03F7/039; H01L21/027
Domestic Patent References:
| JP2009269953A | ||||
| JP2006178317A | ||||
| JP2011141494A | ||||
| JP2006274111A | ||||
| JP2002357901A | ||||
| JP2011209667A |
Foreign References:
| US20100151388 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki