Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP6772992
Kind Code:
B2
Abstract:
A resist composition comprising a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene salt of tetraiodophenolphthalein, tetraiodophenolsulfonphthalein or tetraiodofluorescein exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
Inventors:
Jun Hatakeyama
Application Number:
JP2017169143A
Publication Date:
October 21, 2020
Filing Date:
September 04, 2017
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP8062833A | ||||
| JP2016042171A | ||||
| JP2013068928A |
Foreign References:
| WO2015111640A1 | ||||
| KR1020130026988A |
Attorney, Agent or Firm:
Hideaki International Patent Office