Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP7400658
Kind Code:
B2
Abstract:
A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.
Inventors:
Jun Hatakeyama
Application Number:
JP2020134275A
Publication Date:
December 19, 2023
Filing Date:
August 07, 2020
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C07C39/27; C07C205/22; C07C279/26; C07D295/215; C07F9/06; C08F212/14; C08F220/10; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP201849263A | ||||
| JP201849264A | ||||
| JP2017120367A | ||||
| JP2017120369A | ||||
| JP2017120370A | ||||
| JP2004310004A |
Foreign References:
| WO2008050653A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office