Title:
レジストパターン形成方法および現像条件の決定方法
Document Type and Number:
Japanese Patent JP6575141
Kind Code:
B2
Inventors:
Manabu Hoshino
Application Number:
JP2015104760A
Publication Date:
September 18, 2019
Filing Date:
May 22, 2015
Export Citation:
Assignee:
Zeon Corporation
International Classes:
G03F7/30; C08F212/12; C08F220/22; G03F7/039; G03F7/32; H01L21/027
Domestic Patent References:
| JP2002124448A | ||||
| JP2001267213A |
Foreign References:
| WO2014129556A1 | ||||
| US20140330031 |
Attorney, Agent or Firm:
Kenji Sugimura
Yuta Terashima
Rintaro Takahashi
Yuta Terashima
Rintaro Takahashi