To obtain a resist capable of forming a resist film having satisfactory rigidity, capable of suppressing the falling and breaking of a formed pattern and capable of, therefore, forming a superfine pattern having a high aspect ratio with high sensitivity.
This resist contains a sulfonyl compd. represented by the formula, a compd. having a substituent which is decomposed by an acid to form an alkali-soluble group and an alkali-soluble compd. In the formula, R1 is H, halogen, nitro, cyano, nitrile or a monovalent org. group, R2 is a halogen, nitro, cyano, nitrile or a monovalent org. group, R3 is a divalent org. group and (n) is an integer of ≥2.
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