Title:
レジスト保護膜材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4888655
Kind Code:
B2
Inventors:
Jun Hatakeyama
Application Number:
JP2007110007A
Publication Date:
February 29, 2012
Filing Date:
April 19, 2007
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/11; C08F220/06; C08F228/02; C08F232/00; C08F232/08; H01L21/027
Domestic Patent References:
| JP7295228A | ||||
| JP2009511969A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa