Title:
RESIST RELEASE SOLUTION
Document Type and Number:
Japanese Patent JP3302120
Kind Code:
B2
Abstract:
PURPOSE: To easily release a side wall protecting deposited film and to enhance noncorrosiveness to a wiring material by forming the resist release soln. with sugar alcohol, etc., alcoholamines, water and further quaternary ammonium hydroxide, if necessary.
CONSTITUTION: This soln. is used to remove the deposited film for protecting the side wall of a resist, and consists of at least one kind of material (a) selected from a group consisting of sugar alcohol, isopropyl alcohol, dimethyl sulfoxide and 1,3-dimethyl-2-imidazolidinone, alcoholamine (b), water (c) and further quaternary ammonium hydroxide (d), if necessary. The alcoholamine (b) is selected from a group consisting of monoethanolamine, diethanolamine, etc. Accordingly, the releasability of the side wall protecting deposited film by an org. amine soln. is balanced with the noncorrosiveness of the sugar alcohol or the org. solvent to a wiring material the releasability of the side wall protecting deposited film is improved by the addition of quaternary ammonium hydroxide, and a highly precise circuit wiring is produced.
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Inventors:
Masao Miyazaki
Kiyoto Mori
Kiyoto Mori
Application Number:
JP22041093A
Publication Date:
July 15, 2002
Filing Date:
July 08, 1993
Export Citation:
Assignee:
Kanto Chemical Co., Ltd.
International Classes:
C09D9/00; C23F1/00; G03F7/42; H01L21/027; (IPC1-7): G03F7/42; C09D9/00; C23F1/00; H01L21/027
Domestic Patent References:
| JP243370A | ||||
| JP4124668A | ||||
| JP594024A | ||||
| JP6481950A | ||||
| JP63163352A | ||||
| JP57165834A | ||||
| JP63121848A | ||||
| JP62148953A |
Attorney, Agent or Firm:
Kiyoshi Kuzuwa
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