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Patent Searching and Data


Title:
RESIST UNDERLAYER FILM FORMING COMPOSITION
Document Type and Number:
Japanese Patent JP2009025670
Kind Code:
A
Abstract:

To provide a resist underlayer film forming composition excellent in embedding property, generating a small amount of sublimate, and capable of forming a resist underlayer film excellent in antireflection function and etching resistance.

The resist underlayer film forming composition comprises a polymer having repeating units represented by general formulae (1)-(3) and a solvent.


Inventors:
Nomura, Nakaatsu
Minegishi, Shinya
Konno, Yosuke
Nakajima, Hiromitsu
Application Number:
JP2007000190136
Publication Date:
February 05, 2009
Filing Date:
July 20, 2007
Export Citation:
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Assignee:
JSR CORP
International Classes:
G03F7/11; C08F232/08; H01L21/027
Attorney, Agent or Firm:
小島 清路
萩野 義昇
谷口 直也