Title:
反転オフセット印刷方法
Document Type and Number:
Japanese Patent JP6900819
Kind Code:
B2
Abstract:
To provide an invert off-set printing method for effectively conducting repeating printing while largely suppressing printing defect.SOLUTION: Multiwavelength reflection spectrum of an ink film obtained in an ink film formation process, which is a first process for an invert off-set printing method, to specify coating defect locations, and a coating defect printed matter is eliminated. In an ink film concentration process as a second process, multiwavelength reflection spectrum of the ink film on an elastic substrate having releasability is measured and concentration time is determined. By measuring the multiwavelength reflection spectrum of the elastic substrate is measured and presence/absence of the transfer defect, and drying time of the elastic substrate is determined. Thereby quality is improved by suppression of the printing defect, and the printed matter high in resolution is continuously manufactured.SELECTED DRAWING: Figure 4
More Like This:
Inventors:
Hideyuki Murata
Shunichi Otsuka
Shunichi Otsuka
Application Number:
JP2017146604A
Publication Date:
July 07, 2021
Filing Date:
July 28, 2017
Export Citation:
Assignee:
DIC Corporation
International Classes:
B41M1/02; B41F3/20; B41F33/00; H05K3/20
Domestic Patent References:
| JP2007230109A | ||||
| JP2005305743A | ||||
| JP2006181989A | ||||
| JP2000158620A |
Foreign References:
| WO2015151941A1 | ||||
| US20180120094 |
Attorney, Agent or Firm:
Shinji Ogawa
Akihiro Iwamoto
Takayuki Ohno
Akihiro Iwamoto
Takayuki Ohno