Title:
RING PATTERN EXPOSURE DEVICE AND METHOD
Document Type and Number:
Japanese Patent JP2554601
Kind Code:
B2
Abstract:
PURPOSE: To provide a ring pattern exposure device and method for plotting a highly minute ring pattern having the distribution of arbitrary ring width.
CONSTITUTION: A photosensitive material is formed on the remaining part of a substrate where a reference ring pattern is provided at. a part of a surface and the material is fitted to a rotation supporting means so that the center of a rotary axis is matched with that of the reference ring pattern. A photosensitive material part is irradiated with a plotting optical spot while the substrate is rotated. Reflected light is received from the reference ring and eccentricity between the center of the reference pattern and the rotational center of the substrate is detected. The plotting optical spot and the substrate are relatively displaced, based on detected eccentricity data. The plotted pattern and the rotary center are adjusted to be matched and the plotted patterns become concentric.
Inventors:
Theodor Robert Whitney
Application Number:
JP2634094A
Publication Date:
November 13, 1996
Filing Date:
January 28, 1994
Export Citation:
Assignee:
Theodor Robert Whitney
International Classes:
G02B5/18; G02B9/00; G02B5/32; G02B19/00; G02B27/00; G02B27/18; G02B27/42; G02B27/62; G03F1/08; G03F7/20; G03F9/00; H01L21/027; H01L21/30; H01S3/101; H01S3/137; (IPC1-7): G02B5/18; G03F1/08
Domestic Patent References:
| JP60103310A |
Attorney, Agent or Firm:
Kunihiko Ohashi (1 outside)