Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ROTARY SUBSTRATE PROCESSOR APPARATUS
Document Type and Number:
Japanese Patent JP10064813
Kind Code:
A
Abstract:

To reduce the size of the apparatus having chemical liq. processors and facilitate the maintenance, check and adjustment, by placing the processors along virtual circles and shifting dispensers mounted on rotatable support arms round the vertical axes at the centers of the virtual circles to the processors.

Two chemical liq. processors 2 are disposed so that their vertical axes P1 locate along virtual circles of specified radii. A chemical liq. feeder 3 for feeding chemical liqs. is disposed between the processors and has four dispensers for feeding mutually different chemical, liqs. and support arms 4 rotatable round the vertical axes P2 aligned with the centers of the vertical circles to mount and move the dispensers to feed positions above a substrate W and non-feed positions off from above the substrate, thereby selectively feeding desired chemical liq. to the substrate W.


Inventors:
Koyama, Yoshihiro
Mizohata, Yasuhiro
Tsuji, Masao
Hisai, Akihiro
Kodama, Mitsumasa
Matsunaga, Sanenobu
Yagi, Masanobu
Nakamura, Yasushi
Sato, Seiya
Kobayashi, Ippei
Application Number:
JP1997000099961
Publication Date:
March 06, 1998
Filing Date:
April 17, 1997
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DAINIPPON SCREEN MFG CO LTD
International Classes:
G03F7/16; G03F7/30; H01L21/027; H01L21/304; H01L21/306; G03F7/16; G03F7/30; H01L21/02; (IPC1-7): H01L21/027; G03F7/16; G03F7/30; H01L21/304; H01L21/306