Title:
ROTARY SUBSTRATE TREATMENT DEVICE
Document Type and Number:
Japanese Patent JPH10199852
Kind Code:
A
Abstract:
To provide a rotary substrate treatment device, which can prevent contamination of a substrate caused by a treatment liquid stuck to a rotary mechanical part around the substrate.
A cleaning nozzle 12 is arranged above a peripheral end of a substrate holding part, arranged inside a cup 8. The cleaning nozzle 12 discharges a cleaning liquid on the top and on the side of the substrate holding part 2, so as to wash out a treatment liquid stuck on these surfaces. The cleaning nozzle 12 is held by a nozzle arm 10 to move a prescribed position inside a cup 8 at the time of cleaning and to a shunt outside the cup 8, after finishing the cleaning treatment.
Inventors:
YABE MANABU
NAKAMURA YASUSHI
NAKAMURA YASUSHI
Application Number:
JP386997A
Publication Date:
July 31, 1998
Filing Date:
January 13, 1997
Export Citation:
Assignee:
DAINIPPON SCREEN MFG
International Classes:
B05C11/08; H01L21/027; H01L21/304; (IPC1-7): H01L21/304; B05C11/08; H01L21/027
Attorney, Agent or Firm:
Fukushima Shoto
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