Title:
ROTARY TYPE SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP3518953
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a rotary type substrate treatment apparatus having high washing capacity of a scattering preventing cup, dispensing with an exclusive space for the attaching and detaching operation or keeping of a cup washing jig and capable of suitably rotationally driving only a substrate holding means in low torque at a time of the usual rotary treatment of the substrate.
SOLUTION: At a time of rotary treatment a cup washing member 13 is separated from the rotary shaft 6 of a spin chuck 1 and only the spin chuck 1 is rotationally driven. At a time of the washing of a cup, the spin chuck 1 and the scattering preventing cup 3 are relatively raised and lowered to move the cup washing member 13 to cup washing height and the cup washing member 13 is engaged with and connected to the rotary shaft 6 through a rotation transmission part 35. The cup washing member 13 is rotated in this state and a washing soln. is supplied to a washing soln. guide part 15 from the region above the cup washing member 13 through a washing soln. supply nozzle 12. The washing soln. supplied to the washing soln. guide part 15 is jetted by centrifugal force to wash the inner surface of the scattering preventing cup 3.
Inventors:
Ikeda, Masahide
Application Number:
JP16901196A
Publication Date:
April 12, 2004
Filing Date:
June 28, 1996
Export Citation:
Assignee:
DAINIPPON SCREEN MFG CO LTD
International Classes:
B05C11/08; H01L21/027; H01L21/304; H01L21/31; (IPC1-7): B05C11/08; H01L21/027; H01L21/304; H01L21/31
Attorney, Agent or Firm:
杉谷 勉
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