Title:
ROTARY TYPE SURFACE TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JPS5990928
Kind Code:
A
Abstract:
PURPOSE:To make the titled apparatus small in size by providing a ring-shaped duct so as to be taken into the inside of an accomodating vessel in which the substrate to be treated is set and supplying treatment liquid for the surface of the substrate in rotation. CONSTITUTION:A substrate is attracted by a vacuum chuck 11 with the center aligned and it is rotated at a high speed and simultaneously forced exhaustion is carried out from the exhaustion duct 14. Where, a photo resist liquid is dropped from a nozzle 10, applied photo resist film can be formed on the surface of substrate 12 because a centrifugal force is given. The waste fluid is all splashed to the rear surface of the inclined part of upper cover 22 and is deviated to the externally inclined lower side. Moreover, it is partly splashed to the edge 27' of inclined surface of a rectifying plate 27 and diverged in the form of mist. The external air guided to the accomodating vessel 20 passing the through hole 17 of cover 16 and the through hole 21 of the upper cover enters a ring-shaped duct 15 as the outward radial air flow passing through the gap formed between the inclined surface of the upper cover 22 and the inclined edge part 27' of the rectifying plate 27 and is then exhausted to the outside from an exhaust duct 14.
Inventors:
KITAGAWA MASARU
Application Number:
JP20137082A
Publication Date:
May 25, 1984
Filing Date:
November 16, 1982
Export Citation:
Assignee:
DAINIPPON SCREEN MFG
International Classes:
B05D1/40; B05C11/08; C23F1/08; G03F7/16; H01L21/027; (IPC1-7): B05D1/40; C23F1/08
Attorney, Agent or Firm:
Mamiya Takeo
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