Title:
SLM直接描画装置
Document Type and Number:
Japanese Patent JP2009521108
Kind Code:
A
Abstract:
The present invention relates to an apparatus (100) for patterning a workpiece arranged at an image plane and sensitive to electromagnetic radiation, comprising a source emitting electromagnetic radiation onto an object plane and at least two spatial light modulators each comprising numerous of object pixels, adapted to receive said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said workpiece, wherein said electromagnetic radiation is split into at least two beams, which beams will impinge on different spatial light modulators, by a beam splitting device arranged at an optical plane between said spatial light modulators and an illuminator pupil or a conjugate optical plane. The invention also relates to a method for patterning a workpiece with a plurality of spatial light modulators.
Inventors:
Rock, thomas
Application Number:
JP2008546257A
Publication Date:
May 28, 2009
Filing Date:
December 20, 2006
Export Citation:
Assignee:
Micronic Laser Systems Activora Get
International Classes:
H01L21/027; G02B26/08; G02B26/10; G02B26/12; G03F7/20
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Toru Mori
Yutaka Yoshida
Hajime Asamura
Toru Mori
Yutaka Yoshida