Title:
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023171323
Kind Code:
A
Abstract:
To provide a salt, a resist composition, and the like which allow a resist pattern having good CD uniformity to be produced.SOLUTION: There are provided: a salt of a sulfonium cation of a specific structure and a sulfonate anion of a specific structure; a resin having a structural unit derived from the salt; an acid generator; and a resist composition.SELECTED DRAWING: None
Inventors:
NOJO WATARU
BAN SAYAKA
ICHIKAWA KOJI
BAN SAYAKA
ICHIKAWA KOJI
Application Number:
JP2023081606A
Publication Date:
December 01, 2023
Filing Date:
May 17, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07D303/16; C07D303/48; C07D305/06; C07D307/00; C07D321/10; C08F12/30; C08F20/38; C08F28/02; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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