To provide a resist composition with which a pattern having an excellent focus margin can be obtained.
The present invention relates to a salt represented by formula (I) and a resist composition containing the salt. In the formula, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group; L1 represents a divalent saturated hydrocarbon group, a methylene group included this group may also be substituted with an oxygen atom or a carbonyl group; W represents an alicyclic hydrocarbon group, a methylene group included in this group may also be substituted with an oxygen atom, sulfur atom, carbonyl group or sulfonyl group, and a hydrogen atom included in this group may also be substituted with a hydroxy group, alkyl group, alkoxy group, alicyclic hydrocarbon group or aromatic hydrocarbon group; Rfs represent each independently a fluorine atom or a fluorinated alkyl group; (n) represents an integer of 1 to 10; and Z+ represents an organic counter ion.
OCHIAI MITSUYOSHI
HIRAOKA TAKASHI
