Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2012176936
Kind Code:
A
Abstract:
To provide a resist composition capable of obtaining a resist pattern having excellent line edge roughness (LER).
A salt represented by formula (I) is provided. In the formula: Q1 and Q2 are each independently a fluorine atom or a perfluoroalkyl group; L1 and L2 are each independently a divalent saturated hydrocarbon group wherein a methylene group as a constituent group may be substituted by an oxygen atom or a carbonyl group; Y is an alicyclic hydrocarbon group wherein a substituent may be included and a methylene group as a constituent group may be substituted by an oxygen atom, a sulphonyl group or a carbonyl group; and Z+ is an organic counterion.
Inventors:
ADACHI YUKAKO
SHIGEMATSU JUNJI
ICHIKAWA KOJI
SHIGEMATSU JUNJI
ICHIKAWA KOJI
Application Number:
JP2012011159A
Publication Date:
September 13, 2012
Filing Date:
January 23, 2012
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C381/12; C07C309/17; G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation