Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2015157802
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a salt with which a resist pattern having a favorable focus margin (DOF) can be produced.SOLUTION: The salt generates an acid by light irradiation; and the salt has an acid-labile group containing an acetal structure, and a group in the acid-labile group, which leaves by contact with an acid, has a base-labile group having a fluorine atom. In the above salt, a salt consisting of a cation and an anion having an acid-labile group containing an acetal structure is preferable; a salt consisting of an organic cation and an anion having an acid-labile group containing an acetal structure is more preferable; and a salt consisting of an arylsulfonium cation and an anion having an acid-labile group containing an acetal structure is further preferable.
Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
YAMAMOTO SATOSHI
ICHIKAWA KOJI
YAMAMOTO SATOSHI
Application Number:
JP2015010963A
Publication Date:
September 03, 2015
Filing Date:
January 23, 2015
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D317/72; C07C381/12; C07D319/08; C07D327/06; C09K3/00; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP2011037837A | 2011-02-24 | |||
| JP2013235250A | 2013-11-21 | |||
| JP2012097074A | 2012-05-24 | |||
| JP2012226325A | 2012-11-15 | |||
| JP2013047210A | 2013-03-07 |
Foreign References:
| WO2011115138A1 | 2011-09-22 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto