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Patent Searching and Data


Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2019073499
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), and a resist composition containing the salt.SOLUTION: The salt has a group represented by formula (aa). [Xand Xare each independently O or S; Xis a C1-12 saturated hydrocarbon group having a group represented by formula (2a) or the like; and * is a bond.] [Rand Rare each independently H, a C1-8 alkyl group, or the like; Ris a C1-8 alkyl group in which a methylene moiety may be substituted with O or S; Xis O or S; and * is a bond.]SELECTED DRAWING: None

Inventors:
増山 達郎
山本 敏
市川 幸司
Application Number:
JP2018176976A
Publication Date:
May 16, 2019
Filing Date:
September 21, 2018
Export Citation:
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Assignee:
住友化学株式会社
International Classes:
C07D319/08; C07C381/12; C07D327/06; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
中山 亨
坂元 徹