Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020152718
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.SOLUTION: The salt represented by formula (I), an acid generator, and the resist composition containing the same are provided. [In the formula, R1, R2 and R3 each represent a halogen atom, a fluorinated alkyl group, an alkyl group or the like; m1 represents an integer of 0-5; m2 represents an integer of 0-3; m3 represents an integer of 0-4; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R4 and R5 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO- or the like; L1 represents a single bond or an alkanediyl group, provided that -CH2- contained in the alkanediyl group may be substituted with -O- or -CO-; and A1 represents a cyclic hydrocarbon group which may have a fluorine atom, a fluorinated alkyl group or an alkyl group.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020040925A
Publication Date:
September 24, 2020
Filing Date:
March 10, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07D321/10; C07D333/76; C08F212/14; C08F220/18; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation