Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020176115
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the same.SOLUTION: A salt represented by Formula I, an acid generator, and a resist composition are provided. [In the formula, R1a represents an acid-labile group; R2 and R3 each represent a halogen, a C1-6 fluorinated alkyl, a C1-12 alkyl or the like; m2 represents 0-4; m3 represents 0-5; Q1 and Q2 each represent F or a perfluoroalkyl; L1 represents a saturated hydrocarbon group, and -CH2- contained in the group may be -O- or -CO-, and H contained in the group may be substituted with F or an OH group; and Y1 represents methyl or an alicyclic hydrocarbon group (-CH2- in the alicyclic hydrocarbon group may be -O-, -SO2- or -CO-) which may have a substituent.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020072289A
Publication Date:
October 29, 2020
Filing Date:
April 14, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/76; C07C309/17; C07D307/00; C07D321/10; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation