Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020176116
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.SOLUTION: A salt represented by Formula I, an acid generator, and a resist composition are provided. [In the formula, R1 and R2 each independently represent H, F or a C1-6 alkyl having F; R3 represents F or a C1-6 alkyl having F; R4 and R5 each independently represent halogen, a C1-10 fluorinated alkyl or a C1-12 alkyl, and -CH2- contained in the fluorinated alkyl and the alkyl may be -O- or -CO-; m4 represents 0-4; m5 represents 0-5; and AI- represents an organic anion.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020072290A
Publication Date:
October 29, 2020
Filing Date:
April 14, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/76; C07C309/17; C07D307/00; C07D321/10; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation