SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2020180121

Kind Code:

A

Abstract:

To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).SOLUTION: A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [R1, R2, R3, R4, R5 and R6 each represent a halogen atom or the like; R7 and R8 each represent a halogen atom, OH or the like; R9 represents H or an alkyl group; m7 and m8 each represent an integer of 0-2; m9 represents an integer of 0-5; Q1 and Q2 each represent F or a perfluoroalkyl group; L1 represents a substituted/unsubstituted saturated hydrocarbon group; and Y1 represents a substituted/unsubstituted methyl group or alicyclic hydrocarbon group.]SELECTED DRAWING: None

Inventors:

ADACHI YUKAKO
ICHIKAWA KOJI

Application Number:

JP2020074911A

Publication Date:

November 05, 2020

Filing Date:

April 20, 2020

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07C309/17; C07C381/12; C07D307/33; C07D321/06; C08F212/08; C08F220/26; C09K3/00; G03F7/004; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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