Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020200304
Kind Code:
A
Abstract:
To provide a salt that makes it possible to produce a resist pattern with excellent CD uniformity (CDU), an acid generator and a resist composition containing the same.SOLUTION: The present invention provides a salt represented by formula (I), an acid generator and a resist composition [where R1a, R2a each denote a hydrocarbon group optionally having H or F, or R1a and R2a bind to each other and form a ring optionally having F or an alkyl group; R3a denotes H or, R1a, R2a and R3a bind to each other and form a ring optionally having F or an alkyl group; R4 and R5 denote a halogen atom, a fluorinated alkyl group or the like; m4 denotes an integer of 0-4; m5 denotes an integer of 0-5; Q1 and Q2 each denote F or a perfluoroalkyl group; L1 denotes a saturated hydrocarbon group; Y1 denotes a methyl group or an alicyclic hydrocarbon group optionally having a substituent].SELECTED DRAWING: None
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Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020072414A
Publication Date:
December 17, 2020
Filing Date:
April 14, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/76; C07C309/17; C07D307/00; C07D321/10; C08F20/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation