Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021008463
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition are provided. [R1a and R2a each represent H or an F-substituted/unsubstituted hydrocarbon group or are bonded together to form a ring; R3a represents H, or R1a, R2a and R3a are bonded together to form a ring; R4 represents a halogen atom, a fluorinated alkyl group or the like; R5 represents a halogen atom, a fluorinated alkyl group or the like; m4 represents an integer of 0-4; m5 represents an integer of 0-5; and AI- represents an organic anion.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020112060A
Publication Date:
January 28, 2021
Filing Date:
June 29, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/65; C07C309/17; C07D307/00; C07D321/10; C08F6/00; C08F12/24; C08F20/18; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation